Photomask or wafer compacts: - consisting of antistatic materials or blended thermoplastics proving special electrostatic discharge (ESD) and outgassing properties, - having non porous, abrasion resistant or impact resistant surface properties, - fitted with a specially designed retainer system that protects the photomask or wafers from surface or cosmetic damage and - with or without a gasket seal, of a kind used in the photolithography or other semiconductor production to house photomasks or wafers
Part of: 39231090 — Other
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