Electron beam microscopes fitted with equipment specifically designed for the handling and transport of semiconductor wafers or reticles
Part of: 903180 — Other instruments, appliances and machines:
N084236 · 2009-12-08 — The tariff classification of scanning electron microscopes from Czech Republic
The tariff classification of scanning electron microscopes from Czech Republic Dear Ms. Fura: In your letter dated November 9, 2009, on behalf of FEI Company, you requested a tariff classification ruling. The two items for which you are requesting a ruling are the scanning electron microscopes (SEM), models Magellan 400 and Magellan 400L. You described the Magellan 400 as a general purpose SEM utilized by materials science and semiconductor researchers to test and analyze the true surface of nanoscale structures. The Magellan 400L you described as a SEM fitted with specially designed “load…
N013658 · 2007-07-23 — The tariff classification of Expida Dual Beam Semiconductor Apparatus from the Netherlands
No sample was provided. You are requesting the classification of the “Expida 1255, Expida 1285, and Defect Analyzer 300…” You indicate that all three consist of: “1) A scanning electron microscope (SEM) A focused ion beam (FIB) Dependent on the model, either a ‘load lock’, or a fully automated industrial wafer handler (FOUP wafer handling system, or cassette wafer handling system). Both the ‘load lock’, FOUP, and cassette system are specially designed for the handling and transport of semiconductor wafers to the stage in the system for analysis.” You have attached a copy of Headquarters…
966185 · 2004-02-18 — Protest Number 2904-02-100316; Dual Beam System; Scanning Electron Microscope; Handling and Transport Equipment; ITA.
This is our decision on Protest No. 2904-02-100316, filed against your classification of a dual beam device under the Harmonized Tariff Schedule of the United States (“HTSUS”), imported by FEI Company (“FEI”/”Protestant”). In reaching our conclusion, consideration was given to additional information submitted by Protestant on July 23, 2003. FACTS: The merchandise at issue, the Altura 835 Dual Beam System is an 8” focused dual beam device which employs an ion beam for milling and preparing semiconductor wafers for defect and quality control examination using a scanning electron microscope. The…
966296 · 2004-01-23 — Protest 1704-02-100302; CD-Scanning Electron Microscope
This is our decision on Protest 1704-02-100302 filed against your classification, under the Harmonized Tariff Schedule of the United States (HTSUS), of a scanning electron microscope for measuring semiconductor wafers. The entries were liquidated on May 24, 2002, and the protest was timely filed on August 14, 2002. FACTS: The merchandise at issue is the S-9220 Hitachi Critical Dimension Measurement and Evaluation Scanning Electron Microscope (CD-SEM), and parts and accessories therefor. The S-9220 CD-SEM is essentially comprised of a scanning electron microscope and a…
966482 · 2003-08-19 — CD Measurement and Inspection Scanning Electron Microscope fitted with equipment specifically designed for the handling and transport of semiconductor wafers; Revocation of HQ 962435
On December 15, 1999, this office issued HQ 962435, our decision on the Application for Further Review of Protest # 1001-98-102442, which classified a critical dimension measuring and inspection scanning electron microscope in subheading 9012.10.00, Harmonized Tariff Schedule of the United States (HTSUS). The merchandise was imported by Topcon Technologies, whom you represented at that time. We have reconsidered HQ 962435 and determined the classification to be incorrect. Pursuant to section 625(c), Tariff Act of 1930 (19 U.S.C. 1625(c)), as amended by section 623 of Title VI (Customs…
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