Entirely spherical silicon dioxide micro-spheres, certified by the importer as having mean particle size of 3 to 18 micrometers (µm), linseed oil absorption 150 to 400 ml/g, microbial count less than 100 cfu/g, mold count less than 100 cfu/g, heavy metals less than 20 ppm, surface area 300 to 800 m²/g and pore volume of 0.8 to 2.5 ml/g (CAS No. 7631-86-9) (provided for in subheading 2811.22.10)
Part of: 99 — Temporary legislation; temporary modifications (US)
N349451 · 2025-06-13 — The tariff classification of a hybrid EBL-SEM electron beam lithography system from Germany
The Pioneer Two is a compact electron beam lithography (EBL) system designed for high resolution patterning of semiconductor wafer materials. This direct electron-beam write-on apparatus is designed to write (draw) circuit patterns onto wafers coated with sensitized semiconductor materials. As a hybrid EBL-SEM (scanning electron microscope) system for these semiconductor nanostructures, the Pioneer Two is capable of fabrication (lithography), as well as imaging (electron microscopy), and metrology (measurements using laser interferometer stage) for previously written nanostructures. No…
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